研究所、轉學考(插大)◆生物化學題庫下載題庫

73. Which of the following is the protective mechanism employed by C4 plants to reduce the rate of photorespiration?
(A) Increasing the concentration of CO₂ around RuBisCO
(B) Two partially isolated compartments differentiate within leaves
(C) CO₂ is incorporated into a four-carbon organic acid
(D) All of the above