阿摩線上測驗
登入
首頁
>
研究所、轉學考(插大)-科技英文
>
111年 - 111 國立清華大學_碩士班考試入學試題_動力機械工程學系甲組(熱流與能源組)：科技英文#122874
> 試題詳解
34.
(A) Of,
(B) From,
(C) To,
(D) At,
(E) In
答案：
登入後查看
統計：
尚無統計資料
詳解 (共 1 筆)
MoAI - 您的AI助手
B1 · 2025/10/12
#6878966
當前的題目是關於微流體技術的描述，考生需...
(共 740 字，隱藏中）
前往觀看
0
0
相關試題
35. (A) did not, (B) does not, (C) doing not, (D) are not, (E) being not
#3318735
36. How many corresponding author(s) is/are shown in this article?(A)0, (B) 1, (C) 2, (D) 3, (E) 4
#3318736
37. When did the authors submit the manuscript to the journal? (A) 29 June 2021, (B) 30 July 2021, (C) 31 July 2021, (D) Approximately 1 month, (E) not shown
#3318737
38. What does not allow us to use nanochannels for chemical reaction fields? (A) single-molecule, (B) contamination of the channel surface, (C) 1000 nm-deep nanochannel, (D) 1000 nm-thick resist, (E) fused silica substrate
#3318738
39. What is "metal-free fabrication process" mentioned in this article? (A) to fabricate 1000 nm-deep nanochannel, (B) to fabricate nanochannel with chromium mask, (C) to fabricate nanochannel without chromium mask, (D) to observe oxidation reaction, (E) to keep chromium on the channel surface
#3318739
40. To what extent did remained chromium on the nanochannel surface induce artifact? (A) single molecule level, (B) 1000 nm-deep level, (C) 1000 nm-thick level, (D) micromolar level, (E) not observed
#3318740
41. What was achieved by metal-free fabrication process? (A) contamination of the nanochannel surface, (B) fabrication of 1000 nm-deep nanochannel, (C) Optimization for channels with 1000 nm scale width and depth, (D) to induce oxidation reaction, (E) observation without artifact
#3318741
42. What is the value of maximum signal intensity in the condition of "1 min incubation"? (A) 6 s (B) 12 s (C) 1 µV (D) 3 μV (E) 8 μν
#3318742
43. What is mainly discussed by the authors using this Figure? (A) background signal (B) signal starting to increase at 10 s (C) appeared signal peak around 13 s (D) progress of reaction with increasing incubation time (E) fast reaction within 20 s
#3318743
44. Choose incorrect answer about the fabrication process in Figure 2. (A) Electron beam resist was spin-coated (B) Lithography was performed by electron beam (C) The fused silica was etched by o-xylene (D) Gaseous of SF6 and CHF3 were used for dry etching (E) None
#3318744
相關試卷
112年 - 112 國立清華大學_碩士班考試入學題_動力機械工程學系_甲組(熱流與能源組)：科技英文#118553
2023 年 · #118553
111年 - 111 國立清華大學_碩士班考試入學試題_動力機械工程學系甲組(熱流與能源組)：科技英文#122874
2022 年 · #122874
110年 - 110 國立中山大學碩士暨碩士專班招生考試_醫科所碩士班/乙組:科技英文乙#110458
2021 年 · #110458
110年 - 110 國立清華大學碩士班考試入學試題_部分學系:科技英文#105242
2021 年 · #105242
110年 - 110 國立中山大學碩士暨碩士專班招生考試_機電系碩士班/戊組:科技英文#104361
2021 年 · #104361
110年 - 110 國立中山大學碩士暨碩士專班招生考試_部分碩士班:科技英文#104357
2021 年 · #104357
阿摩線上測驗
登入
阿摩線上測驗
登入
