阿摩線上測驗
73. Which of the following is the protective mechanism employed by C4 plants to reduce the rate of photorespiration?
(A) Increasing the concentration of CO2 around RuBisCO
(B) Two partially isolated compartments differentiate within leaves
(C) CO2 is incorporated into a four-carbon organic acid
(D) All of the above
(A) Increasing the concentration of CO2 around RuBisCO
(B) Two partially isolated compartments differentiate within leaves
(C) CO2 is incorporated into a four-carbon organic acid
(D) All of the above
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統計： A(1), B(0), C(0), D(5), E(0) #3331967
統計： A(1), B(0), C(0), D(5), E(0) #3331967
