73. Which of the following is the protective mechanism employed by C4 plants to reduce the rate of photorespiration?
(A) Increasing the concentration of CO2 around RuBisCO
(B) Two partially isolated compartments differentiate within leaves
(C) CO2 is incorporated into a four-carbon organic acid
(D) All of the above
詳解 (共 2 筆)
未解鎖
這是一道關於 植物生理學 與 光合作用機...
阿摩線上測驗
登入
